<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">vguit</journal-id><journal-title-group><journal-title xml:lang="ru">Вестник Воронежского государственного университета инженерных технологий</journal-title><trans-title-group xml:lang="en"><trans-title>Proceedings of the Voronezh State University of Engineering Technologies</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2226-910X</issn><issn pub-type="epub">2310-1202</issn><publisher><publisher-name>VSUET</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.20914/2310-1202-2026-1-299-305</article-id><article-id custom-type="elpub" pub-id-type="custom">vguit-3760</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Химическая технология</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>Fundamental and Applied chemistry, chemical technology</subject></subj-group></article-categories><title-group><article-title>Методика синтеза люминофора – оксикарбида кремния</article-title><trans-title-group xml:lang="en"><trans-title>Method for synthesizing phosphor – silicon oxycarbide</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0003-1004-9054</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Балдерас</surname><given-names>И. Э.</given-names></name><name name-style="western" xml:lang="en"><surname>Balderas</surname><given-names>I. E.</given-names></name></name-alternatives><bio xml:lang="ru"><p>аспирант, полиграфический факультет, ул. Большая Семёновская, 38, г. Москва, 107023, Россия</p></bio><bio xml:lang="en"><p>graduate student, polygraphic faculty, Bolshaya Semyonovskaya str., 38, Moscow, 107023, Russia</p></bio><email xlink:type="simple">ivan.garciabal@alumno.buap.mx</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0000-9962-6211</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Долгоносов</surname><given-names>В. Ю.</given-names></name><name name-style="western" xml:lang="en"><surname>Dolgonosov</surname><given-names>V. K.</given-names></name></name-alternatives><bio xml:lang="ru"><p>аспирант, полиграфический факультет, ул. Большая Семёновская, 38, г. Москва, 107023, Россия</p></bio><bio xml:lang="en"><p>graduate student, polygraphic faculty, Bolshaya Semyonovskaya str., 38, Moscow, 107023, Russia</p></bio><email xlink:type="simple">dolgonosov@inbox.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0004-3667-8275</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Жалыбина</surname><given-names>А. Ю.</given-names></name><name name-style="western" xml:lang="en"><surname>Zhalybina</surname><given-names>A. Y.</given-names></name></name-alternatives><bio xml:lang="ru"><p>студент, полиграфический факультет, ул. Большая Семёновская, 38, г. Москва, 107023, Россия</p></bio><bio xml:lang="en"><p>student, polygraphic faculty, Bolshaya Semyonovskaya str., 38, Moscow, 107023, Russia</p></bio><email xlink:type="simple">nastya.zhalybina@ya.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0008-8333-4749</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Род</surname><given-names>В. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Rod</surname><given-names>V. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>заведующий лабораторией материаловедения, полиграфический факультет, ул. Большая Семёновская, 38, г. Москва, 107023, Россия</p></bio><bio xml:lang="en"><p>head of the materials science laboratory, polygraphic faculty, Bolshaya Semyonovskaya str., 38, Moscow, 107023, Russia</p></bio><email xlink:type="simple">vikdor.andreevich@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0003-1681-8579</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Утехин</surname><given-names>А. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Utekhin</surname><given-names>A. N.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д.х.н., полиграфический факультет, ул. Большая Семёновская, 38, г. Москва, 107023, Россия</p></bio><bio xml:lang="en"><p>Dr. Sci. (Chem.), polygraphic faculty, Bolshaya Semyonovskaya str., 38, Moscow, 107023, Russia</p></bio><email xlink:type="simple">alutekhin@ya.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-6128-9413</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Конюхов</surname><given-names>В. Ю.</given-names></name><name name-style="western" xml:lang="en"><surname>Konyukhov</surname><given-names>V. Y.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д.х.н., профессор, кафедра общей химии (№19) института общей профессиональной подготовки, Каширское ш., 31, г. Москва, 115409, Россия</p></bio><bio xml:lang="en"><p>Dr. Sci. (Chem.), professor, department of General Chemistry (No. 19) of the Institute of General Professional Training), Kashirskoe shosse, 31 Moscow, 115409, Russia</p></bio><email xlink:type="simple">volkon_1@mail.ru</email><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Московский политехнический университет</institution></aff><aff xml:lang="en"><institution>Moscow Polytechnic University</institution></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Национальный исследовательский ядерный университет «МИФИ»</institution></aff><aff xml:lang="en"><institution>National Research Nuclear University MEPHI</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2026</year></pub-date><pub-date pub-type="epub"><day>01</day><month>04</month><year>2026</year></pub-date><volume>88</volume><issue>1</issue><fpage>299</fpage><lpage>305</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Балдерас И.Э., Долгоносов В.Ю., Жалыбина А.Ю., Род В.А., Утехин А.Н., Конюхов В.Ю., 2026</copyright-statement><copyright-year>2026</copyright-year><copyright-holder xml:lang="ru">Балдерас И.Э., Долгоносов В.Ю., Жалыбина А.Ю., Род В.А., Утехин А.Н., Конюхов В.Ю.</copyright-holder><copyright-holder xml:lang="en">Balderas I.E., Dolgonosov V.K., Zhalybina A.Y., Rod V.A., Utekhin A.N., Konyukhov V.Y.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.vestnik-vsuet.ru/vguit/article/view/3760">https://www.vestnik-vsuet.ru/vguit/article/view/3760</self-uri><abstract><p>Настоящее исследование посвящено разработке лабораторной методике синтеза люминофора - оксикарбида кремния путем химического осаждения из газовой фазы с использованием горячей нити и изучению свойств люминофора в форме тонких пленок и дисперсий. Пленки оксикарбида кремния в настоящем исследовании охарактеризованы с использованием передовых аналитических методов. Сканирующая электронная микроскопия (СЭМ) проводилась на микроскопе Auriga 3916-FESEM, работающем при напряжении 1 кВ, что обеспечивало высокое разрешение для получения изображений морфологии поверхности и структурных особенностей. Систематическое варьирование количества мезопористых гранул кремнезема MCM-41 (масса гранул 5, 10 и 15 г) позволяет провести детальный анализ влияния соотношения прекурсоров на свойства тонких пленок. Энергодисперсионный рентгеновский анализ пленок, полученных из разных количеств тетраэтоксисилана (TEOS) и мезопористых гранул кремнезема MCM-41 подтверждает наличие углерода, кислорода и кремния, что соответствует использованию дозированных количеств тетраэтоксисилан (TEOS) и кремнезема (MCM-41). Сканирующий электронный микроскопический анализ выявляет различные морфологии в тонких пленках оксикарбида кремния: при использовании только тетраэтоксисилана наблюдается поверхность с компактными агрегатами, гетерогенно распределенными, в то время как введение как мезопористых гранул кремнезема TEOS, так и мезопористых гранул кремнезема MCM-41 приводит к формированию пористых кластеров. Установлена усиленная фотолюминесценция в пленках, содержащих кремнезем MCM-41. Исследование раскрывает синергетическое взаимодействие между TEOS и мезопористыми гранулами кремнезема MCM-41, предоставляя ценные сведения для оптимизации тонких пленок оксикарбида кремния для множества применений – от микроэлектроники до оптоэлектроники.</p></abstract><trans-abstract xml:lang="en"><p>This research is development of a laboratory-scale method for synthesizing silicon oxycarbide phosphor via hot-filament chemical vapor deposition and the characterization of the phosphor's properties in the form of thin films and dispersions. Silicon oxycarbide films in this study were characterized using advanced analytical techniques. Scanning electron microscopy (SEM) was performed on an Auriga 3916-FESEM microscope operating at 1 kV, providing high resolution for imaging surface morphology and structural features. Systematic variation in the amount of MCM-41 mesoporous silica granules (granule weights of 5, 10, and 15 g) allows for a detailed analysis of the effect of precursor ratios on the properties of thin films. Energy-dispersive X-ray diffraction analysis of films prepared from varying amounts of tetraethoxysilane (TEOS) and mesoporous silica MCM-41 granules confirms the presence of carbon, oxygen, and silicon, consistent with the use of controlled amounts of tetraethoxysilane (TEOS) and silica (MCM-41). Scanning electron microscopy reveals distinct morphologies in thin silicon oxycarbide films: using only tetraethoxysilane, a surface with compact, heterogeneously distributed aggregates is observed, while the introduction of both mesoporous TEOS and mesoporous silica MCM-41 granules leads to the formation of porous clusters. Enhanced photoluminescence was observed in films containing MCM-41 silica. The study reveals the synergistic interaction between TEOS and mesoporous silica beads MCM-41, providing valuable insights for the optimization of silicon oxycarbide thin films for a variety of applications ranging from microelectronics to optoelectronics.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>оксикарбид кремния</kwd><kwd>пористые кластеры</kwd><kwd>тетраэтоксисилан</kwd><kwd>кремнезем</kwd><kwd>фотолюминесценция</kwd><kwd>сканирующая электронная микроскопия</kwd></kwd-group><kwd-group xml:lang="en"><kwd>silicon oxycarbide</kwd><kwd>porous clusters</kwd><kwd>tetraethoxysilane</kwd><kwd>silica</kwd><kwd>photoluminescence</kwd><kwd>scanning electron microscopy</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Colombo P., Hellmann J.R., Shelleman D.L. Mechanical Properties of Silicon Oxycarbide Ceramic Foams // Journal of the American Ceramic Society. 2001. 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